Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 722: / Line 722: @@
 |nano1.42
 |54 (based on 1 run)
-|100 nm structures: 200 (based on 1 run)
+|100 nm structures: ~200 (based on 1 run)<br>50 nm structures: <br>30 nm structues:
-<br>50 nm structures:
-<br>30 nm structues:
 |-
 |}