Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 719: | Line 719: | ||
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|Slice Si wafer with nano-patterned CSAR, crystal bonded to 4" Si carrier | |Slice of Si wafer with nano-patterned CSAR, crystal bonded to 4" Si carrier | ||
|nano1.42 | |nano1.42 | ||
|54 (based on 1 run) | |54 (based on 1 run) | ||
| | |100 nm structures: 200 (based on 1 run) | ||
50 nm structures: | |||
30 nm structues: | |||
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|} | |} | ||