Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Titanium: Difference between revisions

Knil (talk | contribs)
Knil (talk | contribs)
No edit summary
Line 14: Line 14:
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
|-  
|-  
Line 19: Line 20:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
! General description
! General description
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
Line 30: Line 32:
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|
|RF Ar clean
|RF Ar clean
|-
|-
Line 36: Line 39:
|10Å to 1µm*
|10Å to 1µm*
|10Å to 1 µm*
|10Å to 1 µm*
|10Å to 2000Å
|10Å to 1000Å
|10Å to 1000Å
|.
|.
Line 44: Line 48:
|10Å/s to 15Å/s
|10Å/s to 15Å/s
|About 1Å/s  
|About 1Å/s  
|About 10Å/s
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
|-
|-
Line 60: Line 65:
*12x4" wafers or
*12x4" wafers or
*4x6" wafers
*4x6" wafers
|
*1x 2" wafer or
*1x 4" wafers or
*Several smaller pieces
|
|
*24x2" wafers or  
*24x2" wafers or  
Line 78: Line 87:
* Pyrex wafers  
* Pyrex wafers  
|
|
* Silicon wafers
* Quartz wafers
* Pyrex wafers
|
* III-V materials
* Silicon wafers  
* Silicon wafers  
* Quartz wafers  
* Quartz wafers  
Line 112: Line 126:
* SU-8  
* SU-8  
* Metals  
* Metals  
|
* Silicon oxide
* Silicon (oxy)nitride
* Photoresist
* PMMA
* Mylar
|
|
* Silicon oxide  
* Silicon oxide  
Line 126: Line 146:
|
|
|Only very thin layers (up to 100nm).
|Only very thin layers (up to 100nm).
|
|
|
|-
|-