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| Line 478: |
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| |} | | |} |
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| === wafer 4.09 ===
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| The e-beam exposures presented here are written with 'SHOT A,10', i.e. a shot pitch of 5nm; this pitch works very well for large structures but not so well for 20nm or below. To illustrate this, ACHK screenshot are presented along with SEM inspection picures.
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| {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
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| |-
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|
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| |-
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| |-style="background:Black; text-align:left; color:White"
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| !Process
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| !Equipment
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| !Parameters
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| !Date and initials
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Resist
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| |Fumehood D-3
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| |AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole
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| |16-06-2014 TIGRE
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Spin Coat
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| |Spin Coater LabSpin A-5
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| |1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm
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| |16-06-2014 TIGRE
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |E-beam exposure
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| |JEOL 9500 E-2
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| |0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10, No proximity error correction
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| |02-07-2014 TIGRE
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Develop
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| |Fumehood D-3
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| |SX-AR 600-54/6 60 sec, 60 sec IPA rinse
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| |08-07-2014 TIGRE
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Sputter Coat
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| |Cressington 208HR, DTU CEN
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| |3-5 nm Pt, sputtering
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| |09-07-2014 TIGRE
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Characterization
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| |Zeiss SEM Supra 60VP, D-3
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| |3 kV, WD below 4mm, conducting tape close to pattern
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| |09-07-2014, TIGRE
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| |-
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| |}
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|
