Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|Resist | |Resist | ||
|Fumehood D-3 | |Fumehood D-3 | ||
|AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | |AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole (Bottled opened 16-06-2014 TIGRE) | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Spin Coat | |Spin Coat | ||
|Spin Coater LabSpin A-5 | |Spin Coater LabSpin A-5 | ||
|1 min @ 6000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~50nm | |1 min @ 6000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~50nm (27-08-2014 TIGRE) | ||
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|E-beam exposure | |E-beam exposure | ||
|JEOL 9500 E-2 | |JEOL 9500 E-2 | ||
|0.2 nA, aperture 5, dose 180-420 muC/cm2, Shot pitch 7-27 nm, No proximity error correction | |0.2 nA, aperture 5, dose 180-420 muC/cm2, Shot pitch 7-27 nm, No proximity error correction (27-08-2014 TIGRE) | ||
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|Develop | |Develop | ||
|Fumehood D-3 | |Fumehood D-3 | ||
|SX-AR 600-54/6 60 sec, 30 sec IPA rinse | |SX-AR 600-54/6 60 sec, 30 sec IPA rinse (28-08-2014 TIGRE) | ||
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|Sputter Coat | |Sputter Coat | ||
|Cressington 208HR, DTU CEN | |Cressington 208HR, DTU CEN | ||
|3-5 nm Pt, sputtering | |3-5 nm Pt, sputtering (29-08-2014 TIGRE) | ||
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|Characterization | |Characterization | ||
|Zeiss SEM Supra 60VP, D-3 | |Zeiss SEM Supra 60VP, D-3 | ||
|3 kV, WD below 4mm, conducting tape close to pattern | |3 kV, WD below 4mm, conducting tape close to pattern (29-08-2014 TIGRE) | ||
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