Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 270: | Line 270: | ||
{| cellpadding="2" style="border: 1px solid darkgray;" align="right" | {| cellpadding="2" style="border: 1px solid darkgray;" align="right" | ||
! width="150" | | |||
! width="150" | | ! width="150" | | ||
! width="150" | | ! width="150" | | ||
|- border="0" | |- border="0" | ||
| [[File:mark example.png|120px]] | | [[File:mark example.png|120px]] | ||
| [[File:mark example2.png|120px]] | |||
| [[File:GlobalMark.png|120px]] | | [[File:GlobalMark.png|120px]] | ||
|- align="center" | |- align="center" | ||
| Correct mark || Text around mark not recommended | | Correct mark || Definition of length and width || Text around mark not recommended | ||
|} | |} | ||