Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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[[Image:GlobalMark.png|200px|thumb|Image:GlobalMark.png|200px|thumb|Text around the wafer mark is NOT recommended.]] | [[Image:GlobalMark.png|200px|thumb|Image:GlobalMark.png|200px|thumb|Text around the wafer mark is NOT recommended.]] | ||
{| cellpadding="2" style="border: 1px solid darkgray;" | {| cellpadding="2" style="border: 1px solid darkgray;" align="right" | ||
! width="140" | Correct | ! width="140" | Correct | ||
! width="150" | Not Correct | ! width="150" | Not Correct | ||