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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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=== 140 nm CSAR ===
=== Wafer 3.05 ===




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| [[File:CSAR50nmoverview-10%.png|270px]]
| [[File:CSAR50nmoverview-10%.png|270px]]
| [[File:CSAR50nmlines-10%.png|270px]]
| [[File:CSAR50nmlines-10%.png|270px]]
|NO ACHK
|NO ACHK READY
|-
|-
|-  
|-  
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{| class="wikitable collapsible collapsed" style="border: 5px solid black;" style="width: 90%;" align="center"  
 
!colspan="4"|   SEM inspection of wafer 3.05, 30 nm exposed pattern, shot pitch 5 nm
 
|-
'''30nm'''
 
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
! width="100" | dose [muC/cm2]
! width="250" | 207
! width="250" | 219
! width="250" | 230
! width="250" | 242
|-  
|-  
|
! 207 [muC/cm2]
| [[File:CSAR30nmoverview-10%.png|270px]]
| [[File:CSAR30nmoverview-10%.png|270px]]
| [[File:CSAR30nmlines-10%.png|270px]]
|NO ACHK READY
|-
|-
! 219 [muC/cm2]
| [[File:CSAR30nmoverview-5%.png|270px]]
| [[File:CSAR30nmoverview-5%.png|270px]]
| [[File:CSAR30nmlines-5%.png|270px]]
|
|-
|-
! 230 [muC/cm2]
| [[File:CSAR30nmoverview.png|270px]]
| [[File:CSAR30nmoverview.png|270px]]
| [[File:CSAR30nmlines.png|270px]]
|
|-
|-
! 242 [muC/cm2]
| [[File:CSAR30nmoverview+5%.png|270px]]
| [[File:CSAR30nmoverview+5%.png|270px]]
|-
| [[File:CSAR30nmlines+5%.png|270px]]
|
|
| [[File:CSAR30nmlines-10%.png|270px]]
|-
| [[File:CSAR30nmlines-5%.png|270px]]
|}
| [[File:CSAR30nmlines.png|270px]]
| [[File:CSAR30nmlines+5%.png|270px]]


|}




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