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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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!colspan="6"|Wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm
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! 230 [muC/cm2]
| [[File:53nmCSAR50nmOverviewBasedose.png|250px]]
| [[File:53nmCSAR50nmLinesBasedose.png|250px]]
| [[File:53nmCSAR50nmHolesBasedose.png|250px]]
| [[File:53nmCSAR50nmPillarsBasedose.png|250px]]
| [[File:53nmCSAR50nmTestBasedose.png|250px]]
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!colspan="6"|   SEM inspection of wafer 4.09, 30 nm exposed pattern, shot pitch 5 nm
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!colspan="4"|Wafer 4.09, 30 nm exposed pattern, shot pitch 5 nm
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