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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="4"|Wafer 4.09, 15 nm exposed pattern, shot pitch 5 nm
!colspan="4"|Wafer 4.09, 15 nm exposed pattern, shot pitch 5 nm
|-
|-
! 242 [muC/cm2]
| [[File:53nmCSAR15nmOverviewBasedose+5%.png|250px]]
| [[File:53nmCSAR15nmLinesBasedose+5%.png|250px]]
|[[File:15nmShot10.png|250px]]
|-
|-
|-  
|-  
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| [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]]
| [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]]
| [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]]
| [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]]
|
|[[File:15nmShot10.png|250px]]
|-
|-
|-  
|-  
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'''15nm'''
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 80%;"
! dose [muC/cm2]
! 242
! 253
! 276
! ACHK
|-
|
| [[File:53nmCSAR15nmOverviewBasedose+5%.png|250px]]
| [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]]
| [[File:53nmCSAR15nmOverviewBasedose+20%.png|250px]]
|
|-
|
| [[File:53nmCSAR15nmLinesBasedose+5%.png|250px]]
| [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]]
| [[File:53nmCSAR15nmLinesBasedose+20%.png|250px]]
|[[File:15nmShot10.png|250px]]
|}
|}


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