Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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+{|style="border: 5px solid black;"  style="width: 90%;" align="center"
+|-
-'''20nm'''
+|-
+|-style="background:Black; color:White"
-{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;"
+!colspan="4"|Wafer 4.09, 20 nm exposed pattern, shot pitch 5 nm
-! dose [muC/cm2]
+|-
-! 207
-! 219
-! 230
-! 242
-! 253
-! ACHK
 |-
-|
+! 230 [muC/cm2]
-| [[File:53nmCSAR20nmOverviewBasedose-10%.png|220px]]
-| [[File:53nmCSAR20nmOverviewBasedose-5%.png|220px]]
 | [[File:53nmCSAR20nmOverviewBasedose.png|220px]]
+| [[File:53nmCSAR20nmLinesBasedose.png|220px]]
+| [[File:20nmShot10.png|220px]]
+|-
+|-
+! 242 [muC/cm2]
 | [[File:53nmCSAR20nmOverviewBasedose+5%.png|220px]]
+| [[File:53nmCSAR20nmLines2Basedose+5%.png|220px]]
+|
+|-
+|-
+! 253 [muC/cm2]
 | [[File:53nmCSAR20nmOverviewBasedose+10%.png|220px]]
+| [[File:53nmCSAR20nmLinesBasedose+10%.png|220px]]
 |
+|-
+|}
+{|style="border: 5px solid black;"  style="width: 90%;" align="center"
+|-
+|-
+|-style="background:Black; color:White"
+!colspan="4"|Wafer 4.09, 15 nm exposed pattern, shot pitch 5 nm
+|-
 |-
+! 242 [muC/cm2]
+| [[File:53nmCSAR15nmOverviewBasedose+5%.png|250px]]
+| [[File:53nmCSAR15nmLinesBasedose+5%.png|250px]]
+|[[File:15nmShot10.png|250px]]
+|-
+|-
+! 253 [muC/cm2]
+| [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]]
+| [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]]
 |
-|
+|-
+|-
+! 276 [muC/cm2]
+| [[File:53nmCSAR15nmOverviewBasedose+20%.png|250px]]
+| [[File:53nmCSAR15nmLinesBasedose+20%.png|250px]]
 |
-| [[File:53nmCSAR20nmLinesBasedose.png|220px]]
+|-
-| [[File:53nmCSAR20nmLines2Basedose+5%.png|220px]]
-| [[File:53nmCSAR20nmLinesBasedose+10%.png|220px]]
-| [[File:20nmShot10.png|220px]]
-|-
 |}