Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 341: | Line 341: | ||
|Spin Coater LabSpin A-5 | |Spin Coater LabSpin A-5 | ||
|1 min @ 6000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~50nm | |1 min @ 6000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~50nm | ||
|TIGRE | |27-08-2014 TIGRE | ||
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| Line 348: | Line 348: | ||
|JEOL 9500 E-2 | |JEOL 9500 E-2 | ||
|0.2 nA, aperture 5, dose 180-420 muC/cm2, Shot pitch 7-27 nm | |0.2 nA, aperture 5, dose 180-420 muC/cm2, Shot pitch 7-27 nm | ||
|TIGRE | |27-08-2014 TIGRE | ||
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| Line 355: | Line 355: | ||
|Fumehood D-3 | |Fumehood D-3 | ||
|SX-AR 600-54/6 60 sec, 30 sec IPA rinse | |SX-AR 600-54/6 60 sec, 30 sec IPA rinse | ||
|TIGRE | |28-08-2014 TIGRE | ||
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| Line 362: | Line 362: | ||
|Cressington 208HR, DTU CEN | |Cressington 208HR, DTU CEN | ||
|3-5 nm Pt, sputtering | |3-5 nm Pt, sputtering | ||
|TIGRE | |29-08-2014 TIGRE | ||
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| Line 369: | Line 369: | ||
|Zeiss SEM Supra 60VP, D-3 | |Zeiss SEM Supra 60VP, D-3 | ||
|3 kV, WD below 4mm, conducting tape close to pattern | |3 kV, WD below 4mm, conducting tape close to pattern | ||
|TIGRE | |29-08-2014 TIGRE | ||
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