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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{|style="border: 5px solid black;"  style="width: 80%;" align="center"
 
 
 
{|style="border: 5px solid black;"  style="width: 90%;" align="center"
|-
|-
|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="6"|Wafer 6.13, 30 nm exposed pattern, shot pitch 7 nm
!colspan="7"|Wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm
|-
|-
|-
! 240 [muC/cm2]
| [[File:6_13_30nm_240_shot14.png|230px]]
| [[File:6_13_30nm_240_shot14_Lines.png|230px]]
|
|
| ACHK NOT READY
|-
|-
! 270 [muC/cm2]
| [[File:6_13_30nm_270_shot14.png|230px]]
| [[File:6_13_30nm_270_shot14_Lines.png|230px]]
| [[File:6_13_30nm_270_shot14_Holes.png|230px]]
| [[File:6_13_30nm_270_shot14_Pillars.png|230px]]
| ACHK NOT READY
|-
|-  
|-  
! 300 [muC/cm2]
! 300 [muC/cm2]
| [[File:6_13_30nm_300_shot14.png|230px]]
| [[File:6_13_100nm_300_shot14.png|230px]]
| [[File:6_13_30nm_300_shot14_Lines.png|230px]]
| [[File:6_13_100nm_300_shot14_Lines.png|230px]]
| [[File:6_13_30nm_300_shot14_Holes.png|230px]]
| [[File:6_13_100nm_300_shot14_Holes.png|230px]]  
| [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
| [[File:6_13_100nm_300_shot14_Holes2.png|230px]]
 
| [[File:6_13_100nm_300_shot14_Pillars.png|230px]]
| ACHK NOT READY  
| [[File:6_13_100nm_300_shot14_Test.png|230px]]
! ACHK NOT READY  
|-
|-
|}
|}
Line 437: Line 425:




{|style="border: 5px solid black;"  style="width: 90%;" align="center"
{|style="border: 5px solid black;"  style="width: 80%;" align="center"
|-
|-
|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="7"|Wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm
!colspan="6"|Wafer 6.13, 30 nm exposed pattern, shot pitch 7 nm
|-
|-
|-
! 240 [muC/cm2]
| [[File:6_13_30nm_240_shot14.png|230px]]
| [[File:6_13_30nm_240_shot14_Lines.png|230px]]
|
|
| ACHK NOT READY
|-
|-
! 270 [muC/cm2]
| [[File:6_13_30nm_270_shot14.png|230px]]
| [[File:6_13_30nm_270_shot14_Lines.png|230px]]
| [[File:6_13_30nm_270_shot14_Holes.png|230px]]
| [[File:6_13_30nm_270_shot14_Pillars.png|230px]]
| ACHK NOT READY
|-
|-  
|-  
! 300 [muC/cm2]
! 300 [muC/cm2]
| [[File:6_13_100nm_300_shot14.png|230px]]
| [[File:6_13_30nm_300_shot14.png|230px]]
| [[File:6_13_100nm_300_shot14_Lines.png|230px]]
| [[File:6_13_30nm_300_shot14_Lines.png|230px]]
| [[File:6_13_100nm_300_shot14_Holes.png|230px]]  
| [[File:6_13_30nm_300_shot14_Holes.png|230px]]
| [[File:6_13_100nm_300_shot14_Holes2.png|230px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
| [[File:6_13_100nm_300_shot14_Pillars.png|230px]]
 
| [[File:6_13_100nm_300_shot14_Test.png|230px]]
| ACHK NOT READY  
! ACHK NOT READY  
|-
|-
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/CSAR"