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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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'''30 nm'''
{|style="border: 5px solid black;" style="width: 80%;" align="center"
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;"
|-
|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="5"|30 nm exposed pattern  
!colspan="4"|30 nm exposed pattern  
|-
|-
! dose [muC/cm2]
|-
! 240
! 240 [muC/cm2]
! 270
! 270 [muC/cm2]
! 300
! 300 [muC/cm2]
! ACHK
! ACHK
|-  
|-  
|
| [[File:6_13_30nm_240_shot14.png|250px]]
| [[File:6_13_30nm_240_shot14.png|250px]]
| [[File:6_13_30nm_270_shot14.png|250px]]
| [[File:6_13_30nm_270_shot14.png|250px]]
Line 391: Line 390:
|  
|  
|-  
|-  
|
| [[File:6_13_30nm_240_shot14_Lines.png|250px]]
| [[File:6_13_30nm_240_shot14_Lines.png|250px]]
| [[File:6_13_30nm_270_shot14_Lines.png|250px]]
| [[File:6_13_30nm_270_shot14_Lines.png|250px]]
| [[File:6_13_30nm_300_shot14_Lines.png|250px]]
| [[File:6_13_30nm_300_shot14_Lines.png|250px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-
|}
|}


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