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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|E-beam exposure
|E-beam exposure
|JEOL 9500 E-2
|JEOL 9500 E-2
|0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,14
|0.2 nA, aperture 5, dose 180-420 muC/cm2, SHOT A,14
|TIGRE
|TIGRE
|-
|-
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