Specific Process Knowledge/Characterization: Difference between revisions
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*[[/Optical characterization#Prism_Coupler|Prism Coupler]] | *[[/Optical characterization#Prism_Coupler|Prism Coupler]] | ||
*[[/PL Mapper|PL mapper - ''Photoluminescence mapper'']] | *[[/PL Mapper|PL mapper - ''Photoluminescence mapper'']] | ||
*[[/SIMS: Secondary Ion Mass Spectrometry#Atomika_SIMS|Atomika SIMS]] | *[[/SIMS: Secondary Ion Mass Spectrometry#Atomika_SIMS|Atomika SIMS]] | ||
Revision as of 07:55, 22 August 2014
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Choose characterization topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy