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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
|Standard positive resist, approved, very similar to ZEP520.
|Standard positive resist, approved, very similar to ZEP520.
|[[media:CSAR_62_and_process_chemicals.pdf‎|CSAR_62_and_process_chemicals.pdf‎]], [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|X AR 600-54/6, MIBK:IPA
|X AR 600-54/6, MIBK:IPA
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