Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 156: | Line 156: | ||
|AllResist | |AllResist | ||
|Standard positive resist, approved, very similar to ZEP520. Currently under test. | |Standard positive resist, approved, very similar to ZEP520. Currently under test. | ||
|[[media: | |[[media:Allresist_CSAR62_English.pdf|Allresist_CSAR62_English.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|X AR 600-54/6, MIBK:IPA | |X AR 600-54/6, MIBK:IPA | ||