Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup>) | in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup>) | ||
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|Roughness | |||
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1-25 wafers at a time | |||
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1-25 wafer at a time | |||
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