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Specific Process Knowledge/Thin film deposition/Deposition of Silver: Difference between revisions

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! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])


|-  
|-  
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| Thermal deposition of Ag
| Thermal deposition of Ag
| E-beam deposition of Ag
| E-beam deposition of Ag
| Sputter deposition of Ag
| Sputter deposition of Ag
| Sputter deposition of Ag
| Sputter deposition of Ag
| Sputter deposition of Ag
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! Pre-clean
! Pre-clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean  
|RF Ar clean  
|RF Ar clean  
|RF Ar clean  
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|10Å to about 5000Å  
|10Å to about 5000Å  
|10Å to about 3000Å  
|10Å to about 3000Å  
|10Å to about 1000Å
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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|Dependent on [[/Sputter rates for Ag PVD co-sputter/evaporation|process parameters]].
|Dependent on [[/Sputter rates for Ag PVD co-sputter/evaporation|process parameters]].
|Depending on [[/Sputter Ag in Wordentec|process parameters]] (also written in the logbook).
|Depending on [[/Sputter Ag in Wordentec|process parameters]] (also written in the logbook).
|Dependent on process parameters.
|-
|-


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*24x2" wafers  
*24x2" wafers  


|
*1x6" wafers or
*1x4" wafers or
*smaller pieces


|-style="background:Lightgrey; color:black"
|-style="background:Lightgrey; color:black"
!Allowed materials
!Allowed materials
|
* Silicon
* Silicon oxide
* Silicon (oxy)nitride
* Photoresist
* PMMA
* Mylar
* SU-8
* Metals
|
|
* Silicon  
* Silicon  
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|Only very thin layers.
|Only very thin layers.
|Only very thin layers (up to 100nm).
|Only very thin layers (up to 100nm).
|
|
|
|
|