Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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~0.2 µm/min (70 <sup>o</sup>C) | ~0.2 µm/min (70 <sup>o</sup>C) | ||
in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup> | |||
in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup>) | |||
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