Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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|[http://http://www.microresist.de/home_en.htm MicroResist] | |[http://http://www.microresist.de/home_en.htm MicroResist] | ||
|Standard negative resist | |Standard negative resist | ||
|[[media: | |[[media:mrEBL6000 processing Guidelines.pdf|mrEBL6000 processing Guidelines.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|mr DEV | |mr DEV | ||
|IPA | |IPA | ||
| | | | ||
|[[media: | |[[media:Process_Flow_mrEBL6000.docx|Process_Flow_mrEBL6000.docx]] | ||
|} | |} | ||
Revision as of 12:39, 14 July 2014
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| mr EBL 6000 | Positive | MicroResist | Standard negative resist | mrEBL6000 processing Guidelines.pdf | Manual Spinner 1 (Laurell), Spin Coater Labspin | mr DEV | IPA | Process_Flow_mrEBL6000.docx |