Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions

@@ Line 23: / Line 23: @@
 |[http://http://www.microresist.de/home_en.htm MicroResist]
 |Standard negative resist
-|[[media:CSAR_62_and_process_chemicals.pdf‎|CSAR_62_and_process_chemicals.pdf‎]], [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
+|[[media:mrEBL6000 processing Guidelines.pdf‎|mrEBL6000 processing Guidelines.pdf‎]]
 |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
 |mr DEV
 |IPA
 |
-|[[media:Process_Flow_CSAR.docx‎|Process_Flow_CSAR.docx‎]]
+|[[media:Process_Flow_mrEBL6000.docx‎|Process_Flow_mrEBL6000.docx‎]]
 |}