Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="90%" | |||
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|-style="background:silver; color:black" | |||
|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
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|-style="background:WhiteSmoke; color:black" | |||
|'''[[Specific_Process_Knowledge/Lithography/mrEBL6000|mr EBL 6000]]''' | |||
|Positive | |||
|[http://http://www.microresist.de/home_en.htm MicroResist] | |||
|Standard negative resist | |||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |||
|mr DEV | |||
|IPA | |||
| | |||
|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |||
|} | |||
Revision as of 12:35, 14 July 2014
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| mr EBL 6000 | Positive | MicroResist | Standard negative resist | CSAR_62_and_process_chemicals.pdf, CSAR_62_Abstract_Allresist.pdf | Manual Spinner 1 (Laurell), Spin Coater Labspin | mr DEV | IPA | Process_Flow_CSAR.docx |