Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
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|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
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|-style="background:LightGrey; color:black" | |||
|'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' | |||
|Positive | |||
|ZEON | |||
|Positive resist | |||
|[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|ZEP520A spin curves on SSE Spinner]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |||
|IPA | |||
|acetone/1165 | |||
|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx|Process_Flow_ZEP_with_Al.docx]] | |||
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These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk. | These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk. | ||