Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | ||
|Positive | |Positive | ||
|[ | |[http://www.allresist.com AllResist] | ||
|Standard positive resist, approved, very similar to ZEP520. | |Standard positive resist, approved, very similar to ZEP520. | ||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||