Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 282: | Line 282: | ||
== SEM pictures of dosepatterns == | == SEM pictures of dosepatterns == | ||
The e-beam exposures presented here are written with 'SHOT A,10', i.e. a shot pitch of 5nm; this pitch works very well for large structures but not so well for 20nm or below. ACHK screenshot is therefore presented along with SEM inspection picures. | |||
=== 53 nm CSAR === | === 53 nm CSAR === | ||