Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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| Line 429: | Line 429: | ||
'''20nm''' | '''20nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray; width: 100px; | {| cellpadding="2" style="border: 1px solid darkgray; width: 100px;" | ||
! dose [muC/cm2] | ! dose [muC/cm2] | ||
! 207 | ! 207 | ||