Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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'''20nm''' | |||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | |||
! dose [muC/cm2] | |||
! 207 | |||
! 219 | |||
! 230 | |||
! 242 | |||
! 253 | |||
! ACHK | |||
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| [[File:53nmCSAR20nmOverviewBasedose-10%.png]] | |||
| [[File:53nmCSAR20nmOverviewBasedose-5%.png]] | |||
| [[File:53nmCSAR20nmOverviewBasedose.png]] | |||
| [[File:53nmCSAR20nmOverviewBasedose+5%.png]] | |||
| [[File:53nmCSAR20nmOverviewBasedose+10%.png]] | |||
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|- | |||
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| [[File:53nmCSAR20nmLinesBasedose.png]] | |||
| [[File:53nmCSAR20nmLines2Basedose+5%.png]] | |||
| [[File:53nmCSAR20nmLinesBasedose+10%.png]] | |||
| [[File:20nmShot10.png]] | |||
|- | |||
|} | |} | ||