Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 352: | Line 352: | ||
'''50nm''' | '''50nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 80%;" | ||
! dose [muC/cm2] | ! dose [muC/cm2] | ||
! 230 | ! 230 | ||
| Line 374: | Line 374: | ||
'''30nm''' | '''30nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | ||
! width="100" | dose [muC/cm2] | ! width="100" | dose [muC/cm2] | ||
! width="250" | 219 | ! width="250" | 219 | ||
| Line 397: | Line 397: | ||
'''20nm''' | '''20nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | ||
! width="100" | dose [muC/cm2] | ! width="100" | dose [muC/cm2] | ||
! width="250" | 207 | ! width="250" | 207 | ||
| Line 429: | Line 429: | ||
'''15nm''' | '''15nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 80%;" | ||
! width="100" | dose [muC/cm2] | ! width="100" | dose [muC/cm2] | ||
! width="250" | 242 | ! width="250" | 242 | ||