Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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'''15nm''' | |||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | |||
! width="100" | dose [muC/cm2] | |||
! width="250" | 242 | |||
! width="250" | 253 | |||
! width="250" | 276 | |||
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| [[File:53nmCSAR15nmOverviewBasedose+5%.png|250px]] | |||
| [[File:53nmCSAR15nmOverviewBasedose+10%.png|250px]] | |||
| [[File:53nmCSAR15nmOverviewBasedose+20%.png|250px]] | |||
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| [[File:53nmCSAR15nmLinesBasedose+5%.png|250px]] | |||
| [[File:53nmCSAR15nmLinesBasedose+10%.png|250px]] | |||
| [[File:53nmCSAR15nmLinesBasedose+20%.png|250px]] | |||
|} | |} | ||