Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

@@ Line 45: / Line 45: @@
 Thermal SiO<math>_2</math>
-|
+|Stoichiometric Si<math>_3</math>N<math>_4</math>
-Photoresist (1.5 µm AZ5214E)
+Si-rich Si<math>_3</math>N<math>_4</math>
+PECVD Si<math>_3</math>N<math>_4</math>
+Thermal SiO<math>_2</math>
 |-
 |Etch rate