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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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DCH-Employees-701
2,257 edits
Line 431: Line 431:
|Fumehood D-3
|Fumehood D-3
|AR-P 6200/2 AllResist E-beam resist
|AR-P 6200/2 AllResist E-beam resist
|16-06-2014 TIGRE
|2013 (bottle opened)
|-
|-


Line 437: Line 437:
|Spin Coat
|Spin Coat
|Spin Coater LabSpin A-5
|Spin Coater LabSpin A-5
|1 min @ 6000 rpm, 4000 1/s2, softbake 1 min @ 150 degC, thickness ~143nm
|1 min @ 6000 rpm, 4000 1/s2, softbake 5 min @ 150 degC, thickness ~143nm
|XX-06-2014 TIGRE
|09-04-2014 TIGRE
|-
|-


Line 445: Line 445:
|E-beam exposure
|E-beam exposure
|JEOL 9500 E-2
|JEOL 9500 E-2
|0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10
|2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10
|XX-07-2014 TIGRE
|10-04-2014 TIGRE
|-
|-


Line 455: Line 455:
|Fumehood D-3
|Fumehood D-3
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse
|XX-07-2014 TIGRE
|April/May-2014 TIGRE
|-
|-


Line 464: Line 464:
|Cressington 208HR, DTU CEN
|Cressington 208HR, DTU CEN
|2-3 nm Pt, sputtering
|2-3 nm Pt, sputtering
|XX-07-2014 TIGRE
|22-05-2014 TIGRE
|-
|-


Line 473: Line 473:
|Zeiss SEM Supra 60VP, D-3
|Zeiss SEM Supra 60VP, D-3
|2 kV, WD below 4mm, conducting tape close to pattern
|2 kV, WD below 4mm, conducting tape close to pattern
|XX-07-2014, TIGRE
|06-06-2014, TIGRE
|-
|-


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