Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|-style="background:Black; text-align:left; color:White" | |-style="background:Black; text-align:left; color:White" | ||
!Process | !Process | ||
!Equipment | |||
!Parameters | !Parameters | ||
!Date and initials | !Date and initials | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Resist | |Resist | ||
|Fumehood D-3 | |||
|AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | |AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | ||
|16-06-2014 TIGRE | |16-06-2014 TIGRE | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Spin Coat | |Spin Coat | ||
|Spin Coater LabSpin A-5 | |||
|1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm | |1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm | ||
|16-06-2014 TIGRE | |16-06-2014 TIGRE | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|E-beam exposure | |E-beam exposure | ||
|JEOL 9500 E-2 | |||
|0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10 | |0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10 | ||
|02-07-2014 TIGRE | |02-07-2014 TIGRE | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Develop | |Develop | ||
|Fumehood D-3 | |||
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse | |SX-AR 600-54/6 60 sec, 60 sec IPA rinse | ||
|08-07-2014 TIGRE | |08-07-2014 TIGRE | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Sputter Coat | |Sputter Coat | ||
|Cressington 208HR, DTU CEN | |||
|3-5 nm Pt, sputtering | |3-5 nm Pt, sputtering | ||
|09-07-2014 TIGRE | |09-07-2014 TIGRE | ||
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|Characterization | |Characterization | ||
|Zeiss SEM Supra 60VP, D-3 | |Zeiss SEM Supra 60VP, D-3 | ||
|3 kV, WD below 4mm, conducting tape close to pattern | |||
|09-07-2014, TIGRE | |09-07-2014, TIGRE | ||
|- | |- | ||