Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 295: | Line 295: | ||
|Resist | |Resist | ||
|AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | |AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | ||
| | |16-06-2014 TIGRE | ||
|- | |- | ||
| Line 301: | Line 301: | ||
|Spin Coat | |Spin Coat | ||
|1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm | |1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm | ||
| | |16-06-2014 TIGRE | ||
|- | |- | ||