Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|Spin Coat | |Spin Coat | ||
|colspan="2"|1 min @ 4000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~140nm | |colspan="2"|1 min @ 4000 rpm, 2000 1/s2, softbake 1 min @ 150 degC, thickness ~140nm | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|ESPACER | |ESPACER | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|E-beam exposure | |E-beam exposure | ||
|colspan="2"|2 nA, aperture 5, dose 150-310 muC/cm2, SHOT A,10 | |colspan="2"|2 nA, aperture 5, dose 150-310 muC/cm2, SHOT A,10 | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|Developing | |Developing | ||
|colspan="2"|SX-AR 600-54/6 60 sec, 60 sec IPA rinse | |colspan="2"|SX-AR 600-54/6 60 sec, 60 sec IPA rinse | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|Characterization | |Characterization | ||
|colspan="2"|Nikon ECLIPSE optical microscope, E-5 | |colspan="2"|Nikon ECLIPSE optical microscope, E-5 | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; text-align:center; color:black" | ||
|Characterization | |Characterization | ||
|[[File:NoESPACERoverview2.png|250px]] | |[[File:NoESPACERoverview2.png|250px]] | ||