Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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| [[File:CSAR30nmlines.png|250px]] | | [[File:CSAR30nmlines.png|250px]] | ||
| [[File:CSAR30nmlines+5%.png|250px]] | | [[File:CSAR30nmlines+5%.png|250px]] | ||
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'''20nm''' | |||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | |||
! width="100" | dose [muC/cm2] | |||
! width="250" | 207 | |||
! width="250" | 219 | |||
! width="250" | 230 | |||
! width="250" | 242 | |||
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| | |||
| [[File:CSAR20nmoverview-10%.png|250px]] | |||
| [[File:CSAR20nmoverview-5%.png|250px]] | |||
| [[File:CSAR20nmoverview.png|250px]] | |||
| [[File:CSAR20nmoverview+5%.png|250px]] | |||
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|} | |} | ||