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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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DCH-Employees-701
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!Equipment
!Equipment
!Process Parameters
!Process Parameters
!Comments
|-
|-


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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Resist
|Resist
|AR-P 6200/2 AllResist E-beam resist
|AR-P 6200/2 AllResist E-beam resist
|-
|-


|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Spin Coat
|Spin Coat
|6000 rpm, 4000 1/s2, 60 sec, Softbake 1 min @ 150 degC
|6000 rpm, 4000 1/s2, 60 sec, Softbake 1 min @ 150 degC
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|E-beam exposure
|E-beam exposure
|Dose 207-242 muC/cm2
|Dose 207-242 muC/cm2
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Developing
|Developing
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Coated
|Coated
|2-3 nm Pt, sputtering
|2-3 nm Pt, sputtering
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Characterization
|Characterization
|Zeiss SEM Supra 60VP, D-3
|Zeiss SEM Supra 60VP, D-3
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