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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{| cellpadding="2" style="border: 1px solid darkgray;"
{| cellpadding="2" style="border: 1px solid darkgray;"
! width="140" | dose [muC/cm2]
! width="100" | dose [muC/cm2]
! width="140" | 207
! width="150" | 207
! width="150" | 219
! width="150" | 219
! width="130" | 230
! width="150" | 230
! width="130" | 242
! width="150" | 242
|- border="0"
|- border="0"
|
|
| [[File:CSAR50nmoverview-10%.tif|120px]]
| [[File:CSAR50nmoverview-10%.png|150px]]
| [[File:CSAR50nmoverview-5%.tif|120px]]
| [[File:CSAR50nmoverview-5%.png|150px]]
| [[File:CSAR50nmoverview.png|150px]]
| [[File:CSAR50nmoverview.png|150px]]
| [[File:CSAR50nmoverview+5%.tif|120px]]
| [[File:CSAR50nmoverview+5%.png|150px]]
|- align="center"
|- align="center"


|}
|}
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