Specific Process Knowledge/Doping: Difference between revisions
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This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane. | This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane. | ||
*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | *[[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] - Making boron glass (BSG), phosphorus glass (PSG), boron-phosphorus glass PBSG or germanium doped glass | ||
[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | |||
<!-- Link to the process info page in LabAdviser --> | <!-- Link to the process info page in LabAdviser --> | ||