Specific Process Knowledge/Doping: Difference between revisions
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== | == Doping your wafer == | ||
This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane. | |||
*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | *[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | ||
Revision as of 07:57, 1 July 2014
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Doping your wafer
This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane.
Comparison method 1 and method 2 for the process
| Method 1 | Method 2 | |
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| Generel description | Generel description - method 1 | Generel description - method 2 |
| Parameter 1 |
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| Parameter 2 |
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| Substrate size |
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| Allowed materials |
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