Revision as of 07:40, 1 July 2014

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Drying Comparison Table

Equipment		Spin dryer 1	Spin dryer 2	Spin dryer 3	Spin dryer 4	Critical point dryer
Location		C-1	B-1	D-4	E-5	D-4
Purpose		Drying	Drying	Drying	Drying Rinsing + drying	Drying sensitive samples. E.g. with cantilevers
Substrates	Batch size	1-25 100 mm wafers	1-25 100 mm wafers	1-25 100 mm wafers 1-25 150 mm wafers	? 50 mm wafers 1-25 100 mm wafers 1-25 150 mm wafers	1 to 5 wafers per run. Sizes: 2”, 4" or 6" Pieces (up to 10x10mm)
	Allowed materials	No restrictions	Only for RCA cleaned wafers	No restrictions	No restrictions	Si,SiO2, Si3N4 Quartz and Pyrex InAlP, GaAs SU8

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 |style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>#</nowiki> 100 mm wafers
+*1-25 100 mm wafers
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>#</nowiki> 100 mm wafers
+*1-25 100 mm wafers
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>#</nowiki> 100 mm wafers
+*1-25 100 mm wafers
-*<nowiki>#</nowiki> 150 mm wafers
+*1-25 150 mm wafers
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>#</nowiki> 50 mm wafers
+*? 50 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+*1-25 100 mm wafers
-*<nowiki>#</nowiki> 150 mm wafers
+*1-25 150 mm wafers
 |style="background:WhiteSmoke; color:black"|
 *1 to 5 wafers per run. Sizes: 2”, 4" or 6"