Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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 # Create sdf and jdf-files; read the sdf and jdf-file manual from technical documents found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here]
-# Observe your colleagues when they use the e-beam writer, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). '''In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use.'''
+# Assist a fully trained colleague of yours when she or he e-beam writes, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10).
 # Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program.