Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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 Before you request for a training on the machine
-* it is crucial to have your pattern ready in GDSII format. Check your pattern in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> before contacting the e-beam team. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself.
+# It is crucial to have your pattern ready in GDSII format. Check your GDS-file by importing it in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> or L-edit before contacting the e-beam team. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself.
-* gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). '''In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use.'''
+# Create sdf sdf jdf-files [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here]
-* study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program.
+# gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). '''In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use.'''
-* study the 3 manuals for the machine, they can be found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here]
+# study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program.
+# study the 3 manuals for the machine, they can be found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here]
 == General Rules ==