Jump to content

Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehan (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891, Bureaucrats, danchip, Administrators
1,093 edits
Jehan (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891, Bureaucrats, danchip, Administrators
1,093 edits
Line 352: Line 352:
|ZrO(2)/Y(2)O(3)|| || 99,900%
|ZrO(2)/Y(2)O(3)|| || 99,900%
|}
|}
==Sputtering rates==
==Relative Sputter rates==
===Metals and semiconductors===
===Metals and semiconductors===
{| border=2 cellspacing=0 cellpadding=10  
{| border=2 cellspacing=0 cellpadding=10  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Lesker"