Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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 |ZrO(2)/Y(2)O(3)||	||	99,900%
 |}
+==rates==
+{| border=2 cellspacing=0 cellpadding=10
+|-
+|style=background:LightGrey; color:black|'''Deposition material'''
+|style=background:WhiteSmoke; color:black|'''target thickness'''
+|style=background:WhiteSmoke; color:black|'''Purity'''
+|-
+|Ag||Silver||2.88
+|-
+|Al||Aluminum**||1.00
+|-
+|Au||Gold||1.74
+|-
+|Be||Beryllium||0.21
+|-
+|C||Carbon||0.23
+|-
+|Cu||Copper||1.42
+|-
+|GaAs||Gallium Arsenide {100}||1.03
+|-
+|GaAs||Gallium Arsenide {110}||1.03
+|-
+|Ge||Germanium||1.50
+|-
+|Mo||Molybdenum||0.66
+|-
+|Nb||Niobium||0.76
+|-
+|Pd||Palladium||1.77
+|-
+|Pt||Platinum||1.00
+|-
+|Re||Rhenium||0.84
+|-
+|Rh||Rhodium||1.16
+|-
+|Ru||Ruthenium||0.98
+|-
+|Si||Silicon||0.60
+|-
+|Sm||Samarium||1.74
+|-
+|Ta||Tantalum||0.67
+|-
+|Th||Thorium||1.31
+|-
+|Ti||Titanium||0.53
+|-
+|V||Vanadium||0.50
+|-
+|W||Tungsten||0.57
+|-
+|Y||Yttrium||1.53
+|-
+|Zr||Zirconium||0.88
+|-
+|||||
+|-
+|Oxides and Ceramics||||
+|-
+|Al2O3||Alumina||0.05
+|-
+|SiC||Silicon Carbide||0.22
+|-
+|SiO2||Silicon Dioxide||0.21
+|-
+|TaC||Tantalum Carbide||0.09
+|-
+|Ta2O5||Tantalum Pentoxide||0.39
+-}