Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
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!colspan="7"|AllResist CSAR 1:1 in anisole, Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
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!colspan="7"|AllResist CSAR on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
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Revision as of 14:59, 16 June 2014

These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.


Process Flow

Test of Chemically Semi-Amplified Resist (CSAR); a positive e-beam resist from AllResist (AR-P 6200-2).

Equipment Process Parameters Comments Initials and date
Pretreatment
4" Si wafers No Pretreatment TIGRE, 08-04-2014
Spin Coat
Spin Coater Manual, LabSpin, A-5 AR-P 6200/2 AllResist E-beam resist

60 sec at various spin speed. Acceleration 4000 s-2, softbake 2 - 5 min at 150 deg Celcius

Resist poured directly from bottle TIGRE, 09-04-2014, 16-06-2014
Characterization
Ellipsometer VASE B-1 9 points measured on 100 mm wafer ZEP program used; measured at 70 deg only TIGRE, 09-04-2014
E-beam Exposure
JEOL 9500 E-beam writer, E-1 Dosepattern 14nm - 100nm,

dose 120-280 muC/cm2

Virtual chip mark height detection TIGRE, 10-04-2014
Development
Fumehood, D-3 60 sec in X AR 600-54/6,

60 sec rinse in IPA, N2 Blow dry

Agitation (by hand) while developing TIGRE, 10-04-2014
Characterization
Zeiss SEM Supra 60VP, D-3 TIGRE, ??-04-2014

Spin Curve

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.

AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
2000 4000 225.98 0.97
3000 4000 194.00 0.6
4000 4000 169.57 0.32
5000 4000 151.47 0.26
6000 4000 142.38 0.41
7000 4000 126.59 0.36
AllResist CSAR 1:1 in anisole, Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
2000 4000 83.48 0.49
3000 4000 67.12 0.41
4000 4000 58.64 0.44
5000 4000 53.13 0.39
6000 4000 48.76 0.38


AllResist CSAR on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
3000 4000 201.61 1.20
4000 4000 173.89 0.64
5000 4000 155.91 0.65
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