Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|Standard positive resist | |Standard positive resist | ||
|[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|Spin curves for ZEP520A on SSE Spinner]] | |[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|Spin curves for ZEP520A on SSE Spinner]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters# | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | ||
|IPA | |IPA | ||