Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
| Line 72: | Line 72: | ||
|Dosepattern 14nm - 100nm, | |Dosepattern 14nm - 100nm, | ||
dose 120-280 muC/cm2 | dose 120-280 muC/cm2 | ||
|Virtual chip mark height detection | |Virtual chip mark height detection<sup>2</sup> | ||
| TIGRE | | TIGRE | ||
|- | |- | ||
| Line 108: | Line 108: | ||
1 Disposable pipettes | 1 Disposable pipettes | ||
The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; this bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use. | The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; this bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use. | ||
2 Virtual chip mark detection | |||
The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual. | |||
== Spin Curves == | == Spin Curves == | ||