Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
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The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus | The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers. | ||
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Revision as of 08:25, 16 June 2014
These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
Process Flow
Test of ZEP resist; a positive e-beam resist from ZEON.
| Equipment | Process Parameters | Comments | Initials and date |
|---|---|---|---|
| Pretreatment | |||
| 4" Si wafers | No Pretreatment | TIGRE, 23-04-2014 | |
| Spin Coat | |||
| Spin Coater Manual, LabSpin, A-5 | ZEP520A 1:1 or ZEP520A 1:2 E-beam resist
60 sec at various spin speed. Acceleration 4000 s-2, softbake 2 min at 180 deg Celcius |
Resist poured directly from bottle or by use of disposable pipette1 | TIGRE, 23-04-2014 and 21-05-2014 |
| Characterization | |||
| Ellipsometer VASE B-1 | 9 points measured on 100 mm wafer | ZEP program used; measured at 70 deg only | TIGRE, 23-04-2014 and 21-05-2014 |
| E-beam Exposure | |||
| JEOL 9500 E-beam writer, E-1 | Dosepattern 14nm - 100nm,
dose 120-280 muC/cm2 |
Virtual chip mark height detection | TIGRE |
| Development | |||
| Fumehood, D-3 | 60 sec in N50,
60 sec rinse in IPA, N2 Blow dry |
Agitation (by hand) while developing | TIGRE, XX-04-2014 |
| Characterization | |||
| Zeiss SEM Supra 60VP, D-3 | TIGRE, ??-04-2014 | ||
1 Disposable pipettes The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; this bags must be opened inside a fumehood and each pipette must be cleaned with a N2 gun before use.
Spin Curves
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.
| ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 3000 | 4000 | 111.29 | 0.65 | |||
| 4000 | 4000 | 95.17 | 2.16 | |||
| 5000 | 4000 | 87.23 | 0.81 | |||
| ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 2000 | 4000 | 141.03 | 1.02 | |||
| 3000 | 4000 | 115.96 | 0.98 | |||
| 4000 | 4000 | 100.56 | 0.80 | |||
| 5000 | 4000 | 91.01 | 0.38 | |||
| 6000 | 4000 | 84.85 | 0.37 | |||
| ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 2000 | 4000 | 79.12 | 1.74 | |||
| 3000 | 4000 | 64.30 | 0.34 | |||
| 4000 | 4000 | 55.50 | 0.48 | |||
| 5000 | 4000 | 50.53 | 0.62 | |||
| 6000 | 4000 | 46.34 | 1.01 | |||