Specific Process Knowledge: Difference between revisions
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|[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]] | |[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]] | ||
|PECVD | |PECVD | ||
| | |Deposition of SiO2 or Si3N4 doped with P,B and Ge | ||
|- | |- | ||
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]] | |[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]] | ||